Net Tracing and Classification Analysis on E-Beam Die-to-Database Inspection.Abstract Only. Please Contact Us for full transcript.
SPIE Vol. 9778 (2016)
Automatic High Accurate and Efficient Photomask Defects Management Solution for Advanced Lithography Manufacture.
SPIE Vol. 9050-62 (2014)
Systematic Hot Spots Finding by Pattern Search with Similarity.
Enhanced photomask quality control by 2D structures monitoring using auto image-to-layout method on advanced 28nm technology node or beyond.
SPIE Vol. 8681-60 (2013)
Yield impacting systematic defects search and management.
SPIE Vol. 8327-41 (2012)
Defect Pattern Library Construction for the Lithography Hotspot Pattern Search based on a Two-Level 2D Pattern Matching.
DAC User’s Track (2011)
Systematic failure debug and defective pattern extraction for FPGA product yield improvement.
SPIE Vol. 7641 (2010)
A Kernel-Based DfM Model for Process from Layout to Wafer.
Simulation Based Mask Defect Repair Verification and Disposition.
SPIE Vol. 7488 (2009)
Design for Manufacturability Guideline Development: Integrated Foundry Approach.
SPIE Vol. 7122 (2008)
Improvement on OPC completeness through pre-OPC hot spot detection and fix.
SPIE Vol. 6925 (2008)
Pattern Centric OPC Flow: a Special RET Flow with Fast Turn-Around-Time.
SPIE Vol. 6924 (2008)
Distributed model calibration using Levenberg-Marquardt algorithm.
SPIE Vol. 6520 (2007)
Post-OPC verification using a full-chip Pattern-Based simulation verification method.
SPIE Vol. 5992 (2005)
Design Guided Data Analysis for Summarizing Systematic Pattern Defects and Process Window.Abstract Only. Please Contact Us for full transcript.
Smart Review Sampling Methodology in Huge Inspection Results.
Inspection Flow of Yield Impacting Systematic Defects.
Joint Symposium of eMDC-2013 and ISSM-2013
Hotspot Classification Based on Higher-order Local Autocorrelation.
SPIE Vol. 8522-102 (2012)
Simulation Based Mask Defect Printability Verification and Disposition, Part II.
SPIE Vol. 8166 (2011)
OPC Verification and Hot Spot Management for Yield Enhancement through Layout Analysis.
SPIE Vol. 7971 (2011)
Detection of OPC Conflict Edges through MEEF Analysis.
Hot Spot Management through Design Based Metrology - Measurement and Filtering.
SPIE Vol. 7520 (2009)
Systematic Defect Filtering and Data Analysis Methodology for Design Based Metrology.
SPIE Vol. 7272 (2009)
Combination of rule and pattern based lithography unfriendly pattern detection in OPC flow.
A Procedure to Back-annotate Process Induced Layout Dimension Changes into the Post Layout Simulation Netlist.
A Feasible Model-Based OPC Algorithm Using Jacobian Matrix of Intensity Distribution Functions.
DFM: A Practical Layout Optimization Procedure for the Improved Process Window for an Existing 90-nm Product.
SPIE Vol. 6156 (2006)
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