Papers

My Image
My Image
../resources/PDF/Net-Tracing-for-DVC-Defects.pdf,[iframe]

Net Tracing and Classification Analysis on E-Beam Die-to-Database Inspection.

Abstract Only. Please Contact Us for full transcript.

SPIE Vol. 9778 (2016)

My Image
My Image
../resources/PDF/Automatically-High-Accurate-and-Efficient-Photomask-Defects-Management-Solution-for-Advanced-Lithography-Manufacture.pdf,[iframe]

Automatic High Accurate and Efficient Photomask Defects Management Solution for Advanced Lithography Manufacture.

SPIE Vol. 9050-62 (2014)

My Image
My Image
../resources/PDF/CSTIC2014_Full-Paper_systematic-hot-spot-finding-by-pattern-search-with-similarity_Final_1216.pdf,[iframe]

Systematic Hot Spots Finding by Pattern Search with Similarity.

CSTIC 2014

My Image
My Image
../resources/PDF/2D_X_Final_2013_0110_1.pdf,[iframe]

Enhanced photomask quality control by 2D structures monitoring using auto image-to-layout method on advanced 28nm technology node or beyond.

SPIE Vol. 8681-60 (2013)

My Image
My Image
../resources/PDF/Manuscript-8327-41-Yield-impacting-systematic-defects-search-and-management.pdf,[iframe]

Yield impacting systematic defects search and management.

SPIE Vol. 8327-41 (2012)

My Image
My Image
../resources/PDF/126-LA433__DAC-2011.pdf,[iframe]

Defect Pattern Library Construction for the Lithography Hotspot Pattern Search based on a Two-Level 2D Pattern Matching.

DAC User’s Track (2011)

My Image
My Image
../resources/PDF/SPIE2010-7641-10_Systematic-Failure.pdf,[iframe]

Systematic failure debug and defective pattern extraction for FPGA product yield improvement.

SPIE Vol. 7641 (2010)

My Image
My Image
../resources/PDF/kernel-based_DFM_model_for_process_from_layout_to_wafer_ZheDa.pdf,[iframe]

A Kernel-Based DfM Model for Process from Layout to Wafer.

SPIE Vol. 7641 (2010)

My Image
My Image
../resources/PDF/7488_14.pdf,[iframe]

Simulation Based Mask Defect Repair Verification and Disposition.

SPIE Vol. 7488 (2009)

My Image
My Image
../resources/PDF/7122_73-DFM_Guideline_development.pdf,[iframe]

Design for Manufacturability Guideline Development: Integrated Foundry Approach.

SPIE Vol. 7122 (2008)

My Image
My Image
../resources/PDF/6925_37-OPC_Improvement.pdf,[iframe]

Improvement on OPC completeness through pre-OPC hot spot detection and fix.

SPIE Vol. 6925 (2008)

My Image
My Image
../resources/PDF/6924_146.pdf,[iframe]

Pattern Centric OPC Flow: a Special RET Flow with Fast Turn-Around-Time.

SPIE Vol. 6924 (2008)

My Image
My Image
../resources/PDF/6520_125.pdf,[iframe]

Distributed model calibration using Levenberg-Marquardt algorithm.

SPIE Vol. 6520 (2007)

My Image
My Image
../resources/PDF/5992_100.pdf,[iframe]

Post-OPC verification using a full-chip Pattern-Based simulation verification method.

SPIE Vol. 5992 (2005)

My Image
My Image
../resources/PDF/Design-guided-data-analysis-for-process-window.pdf,[iframe]

Design Guided Data Analysis for Summarizing Systematic Pattern Defects and Process Window.

Abstract Only. Please Contact Us for full transcript.

SPIE Vol. 9778 (2016)

My Image
My Image
../resources/PDF/CSTIC2014_Full-Paper_Smart_Sampling_Final-1216.pdf,[iframe]

Smart Review Sampling Methodology in Huge Inspection Results.

CSTIC 2014

My Image
My Image
../resources/PDF/Inspection-Flow-of-Yield-Impacting-Systematic-Defect_final.pdf,[iframe]

Inspection Flow of Yield Impacting Systematic Defects.

Joint Symposium of eMDC-2013 and ISSM-2013

My Image
My Image
../resources/PDF/Hotspot-Classification-Based-on-Higher-order-Local-Autocorrelation.pdf,[iframe]

Hotspot Classification Based on Higher-order Local Autocorrelation.

SPIE Vol. 8522-102 (2012)

My Image
My Image
../resources/PDF/8166_82.PDF,[iframe]

Simulation Based Mask Defect Printability Verification and Disposition, Part II.

SPIE Vol. 8166 (2011)

My Image
My Image
../resources/PDF/7971_16-Hynix.pdf,[iframe]

OPC Verification and Hot Spot Management for Yield Enhancement through Layout Analysis.

SPIE Vol. 7971 (2011)

My Image
My Image
../resources/PDF/Manuscript_OPC_Conflict_SPIE2010_final.pdf,[iframe]

Detection of OPC Conflict Edges through MEEF Analysis.

SPIE Vol. 7641 (2010)

My Image
My Image
../resources/PDF/7520-63.pdf,[iframe]

Hot Spot Management through Design Based Metrology - Measurement and Filtering.

SPIE Vol. 7520 (2009)

My Image
My Image
../resources/PDF/SPIE-manuscript-7272-53-YANG.pdf,[iframe]

Systematic Defect Filtering and Data Analysis Methodology for Design Based Metrology.

SPIE Vol. 7272 (2009)

My Image
My Image
../resources/PDF/7122_58-Rule_and_Pattern_based_hotspot_detection.pdf,[iframe]

Combination of rule and pattern based lithography unfriendly pattern detection in OPC flow.

SPIE Vol. 7122 (2008)

My Image
My Image
../resources/PDF/6925_29.pdf,[iframe]

A Procedure to Back-annotate Process Induced Layout Dimension Changes into the Post Layout Simulation Netlist.

SPIE Vol. 6924 (2008)

My Image
My Image
../resources/PDF/6520_172.pdf,[iframe]

A Feasible Model-Based OPC Algorithm Using Jacobian Matrix of Intensity Distribution Functions.

SPIE Vol. 6520 (2007)

My Image
My Image
../resources/PDF/6156_11.pdf,[iframe]

DFM: A Practical Layout Optimization Procedure for the Improved Process Window for an Existing 90-nm Product.

SPIE Vol. 6156 (2006)

This website uses cookies to enhance user experience and to analyze performance and traffic on our website. We do not share this information with third parties. By continuing to browse our site, you consent to the placement of these cookies on your device.